星空体育(中国)官方网站入口|星空体育·(中国)官方网站

Chinese Chinese Products Equipment Series Equipment Series Unpatterned Wafer Defect Inspection Equipment Series Patterned Wafer Defect Inspection Equipment Series Metrology Equipment Series Overlay Metrology Equipment Series 3D Surface Profiling Metrology Equipment Series Dielectric Film Metrology Equipment Series Software series Software Yield Management System DMS/YMS Semiconductor Auto Defect Classification System Skyverse Company Introduction Development History Corporate Culture Certificates of Honor News News Recruitment Social Recruitment Campus Recruitment Contact Investor Relations Overlay Metrology Equipment Series DRAGONBLOOD Home > Products > Metrology Equipment Series Product Introduction This series of equipment is primarily designed for measuring overlay errors in integrated circuit photolithography processes. By modeling data and providing feedback to the photolithography machine, it assists in minimizing alignment errors between different layers of photolithography patterns, ultimately enhancing alignment accuracy. Product Features 1、Sub-nanometer level accuracy and working modes for multiple design nodes ensure robustness against process variations. 2、Preventive diagnostics and automatic calibration guarantee stable equipment operation. 3、Equipped with automatic recipe optimization and centralized assessment and data management, effectively reducing labor costs. 4、Multi-dimensional result evaluation and display provide fast identification of process issues inline. Previous Product Null Next Product 3D Surface Profiling Metrology Equipment Series CYPRESS Products Equipment Series Software series Skyverse Company Introduction Development History Corporate Culture Certificates of Honor News News Recruitment Social Recruitment Campus Recruitment Contact Investor Relations All rights reserved. Infringement will be investigated. 粤ICP备16055877号 WeChat QR Code -->